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NO gas-sensing properties of In2O3 nanobelt films prepared by thermal evaporation

진공증착법으로 제조한 In2O3 나노벨트막의 NO가스감지특성

  • Choi, Mu-Hee (Department of Electrical Engineering & ERI., Gyeongsang Natl Univ.) ;
  • Ma, Tae-Young (Department of Electrical Engineering & ERI., Gyeongsang Natl Univ.)
  • 최무희 (경상대학교 전기공학과 및 공학연구원) ;
  • 마대영 (경상대학교 전기공학과 및 공학연구원)
  • Published : 2006.11.30

Abstract

The films of indium oxide $In_{2}O_{3}$) were deposited onto $SiO_{2}$ coated Si wafers by a thermal evaporation method. Substrate temperature was varied from $25^{\circ}C$ to $300^{\circ}C$. Deposition rate increased to $250^{\circ}C$ and then decreased rapidly. The crystallographic properties and surface morphologies of the films were investigated by X-ray diffraction (XRD) and scanning electron microscope (SEM), respectively. The films deposited at $250^{\circ}C$ were found to have a nanobelt structure. Resistor-type gas-sensors were fabricated with $In_{2}O_{3}$ films using Pt as electrodes. The resistance variation of $In_{2}O_{3}$ films with the concentration of NO gas was measured. The $In_{2}O_{3}$ films deposited at $250^{\circ}C$ showed the highest sensitivity to the NO gas.

Keywords

References

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