Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Influence of Deposition Pressure on Optical and Electrical Properties of ITO/Al/ITO Thin Films on PET by RF Magnetron Sputtering

RF magnetron sputter에 의한 PET기판상 ITO/Al/ITO 박막의 증착 압력이 광학적 전기적 특성에 미치는 영향

  • Seo Jung-Eun (Korea University of Technology and Education, Advanced Materials Engineerin) ;
  • Kim Sang-Ho (Korea University of Technology and Education, Advanced Materials Engineerin) ;
  • Lee In-Seon (Korea University of Technology and Education, Advanced Materials Engineerin) ;
  • Kim Dong-Won (Kyonggi University)
  • 서정은 (한국기술교육대학교 신소재공학과) ;
  • 김상호 (한국기술교육대학교 신소재공학과) ;
  • 이인선 (한국기술교육대학교 신소재공학과) ;
  • 김동원 (경기대학교 신소재공학과)
  • Published : 2005.04.01
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Abstract

ITO-Al-ITO multi-layers were deposited at room temperature by RF magnetron sputtering on polyethylene terephthalate (PET). The films were deposited at various pressures of $8\times10^{-4},\;1\times10^{-3},\;4\times10^{-3},\;8\times10^{-3}\;and\;1\times10^{-2}$ Torr. A correlation between microstructure and electro-optical properties was studied. Films deposited? at low pressure have higher transmission, and lower reflectance and resistance than film deposited at high pressure. Sheet resistance, transmission, and reflectance were $141.6\Omega/\Box\;88\%\;and\;6.8\%$ resectively when the deposition pressure was $8\times10^{-4}$ torr, that was the optimum condition.

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References

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