Optical and Electrical Properties of ITO/Ni/ITO Thin Films

ITO/Ni/ITO 박막의 광학적 전기적 특성 연구

  • Kim So-Ra (Korea University of Technology and Education, Advanced Materials Engineering) ;
  • Seo Jung-Eun (Korea University of Technology and Education, Advanced Materials Engineering) ;
  • Kim Sang-Ho (Korea University of Technology and Education, Advanced Materials Engineering) ;
  • Lee In-Seon (Korea University of Technology and Education, Advanced Materials Engineering) ;
  • Kim Dong-Won (Kyonggi University)
  • 김소라 (한국기술교육대학교 신소재공학과) ;
  • 서정은 (한국기술교육대학교 신소재공학과) ;
  • 김상호 (한국기술교육대학교 신소재공학과) ;
  • 이인선 (한국기술교육대학교 신소재공학과) ;
  • 김동원 (경기대학교 신소재공학과)
  • Published : 2005.04.01

Abstract

ITO/Ni/ITO thin films were deposited on the PET by RF magnetron sputtering. Dependance of the process parameters such as deposition pressure, positions of Ni layer, on the transmittance, reflectance and sheet resistance of ITO/Ni/ITO film were investigated. When the Ni layer is placed at the center of ITO and deposition pressure is low, ITO/Ni/ITO films showed better optical and electrical properties. At these conditions, the transmittance, reflectance and sheet resistance of the ITO film were $90\%,\;0.38\%$ and $185\Omega/\Box$ respectively.

Keywords

References

  1. K. L. Chopra, S. Major, D. K. Pandya, Thin Solid Films, 102 (1983) 1 https://doi.org/10.1016/0040-6090(83)90256-0
  2. Tom Feng, Amal K. Ghost, Chales Fishman, J. AppI. Phys., 50(7) (1979) 4972 https://doi.org/10.1063/1.325574
  3. L. R. Cruza, C. Legnania, I. G. Matosoa, C. L. Ferreiraa, H. R. Moutinho, Materials Research Bulletin, 39 (2004) 993 https://doi.org/10.1016/j.materresbull.2004.03.008
  4. L.-J. Meng, M. P. Dos Santos, Thin Solid Films, 303 (1997) 151 https://doi.org/10.1016/S0040-6090(97)00089-8
  5. Y-S. Kim, Y.-C. Park, S. G. Ansari, J.-Y. Lee, B. -S. Lee, H.-S. Shin, Surface and Coatings Technology, 173 (2003) 299 https://doi.org/10.1016/S0257-8972(03)00717-5