References
- Yamaguchi, H., Shimase, A., Haraichi, S. and Miyauchi, T., 'Characteristics of Silicon Removal by Fine Focused Gallium Ion Beam,' Journal of Vacuum Science and Technology B, Vol. 3, No. 1, pp. 71-74, 1985 https://doi.org/10.1116/1.583294
- Melngailis, J. and Musil, C., 'The Focused Ion Beam as An Integrated Circuit Restructuring Tool,' Journal of Vacuum Science and Technology B, Vol. 4, No. 1 pp. 176-180, 1987 https://doi.org/10.1116/1.583373
- Harriott, L., Scotti, R., Cumminggs, K. and Ambrose, A., 'Micromachining of Optical Structures with Focused Ion Beams,' Journal of Vacuum Science and Technology B, Vol. 5, No. 1, pp. 207-210, 1987 https://doi.org/10.1116/1.583865
- Sudraud, P. and Ben Assayag, G., 'Focused Ion Beam Milling, Scanning Electron Microscopy, and Focused Droplet Deposition in a Single Microcircuit Surgery Tool,' Journal of Vacuum Science and Technology B, Vol. 6, No. 1, pp. 234-238, 1988 https://doi.org/10.1116/1.584012
- Vasile, M., Niu, Z., Nassar, R., Zhang, W. and Liu, S., 'Focused Ion Beam Milling: Depth Control for Three-Dimensional Microfabrication,' Journal of Vacuum Science and Technology B, Vol. 15, No. 6, pp. 2350-2354, 1997 https://doi.org/10.1116/1.589644
- Santamore, D., Edinger, K., Orloff, J. and Melngailis, J., 'Focused Ion Beam Sputter Yield Change as a Function of Scan Speed,' Journal of Vacuum Science and Technology B, Vol. 15, No. 6, pp. 2346-2349, 1997 https://doi.org/10.1116/1.589643
- Brodie, I. and Muray, J. J., 'Particle beams: sources, optics, and interactions,' New York: Plenum, chapter 2, 1992