대한전기학회논문지:전기물성ㆍ응용부문C (The Transactions of the Korean Institute of Electrical Engineers C)

대한전기학회 (The Korean Institute of Electrical Engineers)
권호 표지

진공 어닐링한 바나듐 산화악의 구조적, 전기적 특성

Structural and Electrical Properties of Vanadium Oxide Thin Films Annealed in Vacuum

  • 최복길 (공주대 공대 정보통신공학부) ;
  • 최창규 (서울산업대 전기공학과) ;
  • 권광호 (한서대 공대 전자공학과) ;
  • 김성진 (경남대 공대 전자전기공학부)
  • 발행 : 2005.01.01
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⟨ 이전 논문 다음 논문 ⟩

초록

Thin films of vanadium oxide(VO/sub x/) were deposited by r.f. magnetron sputtering from V₂O/sub 5/ target with oxygen/(oxygen+argon) partial pressure ratio of 0% and 8% and in situ annealed in vacuum at 400℃ for 1h and 4h. Crystal structure, chemical composition, molecular structure, optical and electrical properties of films were characterized through XRD, XPS, RBS, FTIR, optical absorption and electrical conductivity measurements. The films as-deposited are amorphous, but 0%O₂ films annealed for time longer than 4h and 8% O₂ films annealed for time longer than 1h are polycrystalline. As the oxygen partial pressure is increased the films become more stoichiometric V₂O/sub 5/. When annealed at 400℃, the as-deposited films are reduced to a lower oxide. The optical transmission of the films annealed in vacuum decreases considerably than the as-deposited films and the optical absorption of all the films increases rapidly at wavelength shorter than about 550nm. Electrical conductivity and thermal activation energy are increased with increasing the annealing time and with decreasing the oxygen partial pressure.

키워드

참고문헌

  1. R. T. R. Kumar, B. Karunagaran, D. Mangalaraj, S. K. Narayandass, P. Manoravi, M. Joseph, and V. Gopal, 'Pulsed laser deposited vanadium oxide thin films for uncooled infrared detectors', Sensors and Actuators, vol. A107, pp. 62-67, 2003 https://doi.org/10.1016/S0924-4247(03)00233-4
  2. D. S. Tezcan, S. Eminoglu, and T. Akin, 'A low-cost uncooled infrared micro bolometer detector in standard CMOS technology', IEEE Trans. Electron Devices, vol. 50, no. 2, pp. 494-501, 2003 https://doi.org/10.1109/TED.2002.807453
  3. L. Dong, R. Yue, and L. Liu, 'An uncooled microbolometer infrared detector based on poly-SiGe thermistor', Sensors and Actuators, vol. A105, pp. 286-292, 2003 https://doi.org/10.1016/S0924-4247(03)00232-2
  4. A. M. Abo El Soud, B. Mansour, and L. I. Soliman, 'Optical and electrical properties of $V_2O_5$ thin films', Thin Solid Films, vol. 247, pp. 140-143, 1994 https://doi.org/10.1016/0040-6090(94)90487-1
  5. R. Hornsey, P. Thomas, A. Savchenko, and T. Pope, 'Nonoptical characterization techniques for uncooled microbolometer infrared sensors', IEEE Trans. Electron Devices, vol. 47, no. 12, pp. 2294-2300, 2000 https://doi.org/10.1109/16.887011
  6. G. A. Nyberg and R. A. Buhrman, 'Preparation and optical properties of reactively evaporated $VO_2$ thin films', J. Vac. Sci. Technol., vol. A2, pp. 301-302, 1984
  7. A. Z. Moshfegh and A. Ignatiev, 'Formation and characterization of thin film vanadium oxides', Thin Solid Films, Vol. 198, pp. 251-268, 1991 https://doi.org/10.1016/0040-6090(91)90344-W
  8. S. D. Hansen and C. R. Aita, 'Low temperature reactive sputter deposition of vanadium oxide', J. Vac. Sci. Technol., vol. A3, pp. 660-663, 1985 https://doi.org/10.1116/1.572974
  9. N. Ozer, S. Sabuncu, and J. Cronin, 'Electrochromic properties of sol-gel deposited Ti-doped vanadium oxide film'. Thin Solid Films, vol. 338, pp. 201-206, 1999 https://doi.org/10.1016/S0040-6090(98)00974-2
  10. V. S. Pankajakshan and K. Neelakandan, 'Electrical conductivity of vacuum-deposited vanadium pent-oxide thin films', Thin Solid Films, vol. 215, pp. 196-199, 1992 https://doi.org/10.1016/0040-6090(92)90437-G
  11. G. A. Sawatzky and D. Post, 'X -ray photoelectron and Auger spectroscopy study of some vanadium oxides', Phys. Rev. B, vol. 20, pp. 1546-1555, 1979 https://doi.org/10.1103/PhysRevB.20.1546
  12. G. A. Khan and C. A. Hogarth, 'Infrared absorption spectra of evaporated $V_2O_5$ and co-evaporated $V_2O_5/B_2O_3$ thin films', J. Mater. Sci., vol. 26, pp. 799-803, 1991 https://doi.org/10.1007/BF00588318
  13. R. Ramirez, B. Casal, L. Utrera, and E. Ruiz.-Hitzky, 'Oxygen reactivity in vanadium pentoxide: electronic structure and infrared spectroscopy studies', J. Phys. Chem., vol. 94, no. 26, pp. 8960-8965, 1990 https://doi.org/10.1021/j100389a021
  14. C. V. Ramana and O. M. Hussain, 'Optical absorption behaviour of vanadium pentoxide thin films', Adv. Mater. Opt. Electron., vol. 7, pp. 225-231, 1997 https://doi.org/10.1002/(SICI)1099-0712(199709)7:5<225::AID-AMO309>3.0.CO;2-R
  15. C. R. Aita, Y. L. Liu, M. L. Kao, and S. D. Hansen, 'Optical behavior of sputter-deposited vanadium pentoxide', J. Appl. Phys., vol. 60, no. 2, pp. 749-753, 1986 https://doi.org/10.1063/1.337425
  16. S. Krishnakumar and C. S. Menon, 'Optical and electrical properties of vanadium pentoxide thin films', Phys, Stat. Sol., vol. A153, pp. 439-444, 1996 https://doi.org/10.1002/pssa.2211530218
  17. C. M. Osburn and E. J. Weitzman, 'Electrical conduction and dielectric breakdown in silicon dioxide films on silicon', J. Electrochem. Soc., vol. 119, no. 5, pp. 603-609, 1972 https://doi.org/10.1149/1.2404270