Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Structure and Properties of Indium Tin Oxide Thin Films Sputtered from Different Target Densities

  • Kim Kyoo Ho (Yeungnam University, School of Materials Science and Engineering) ;
  • Jung Young Hee (LG Electronics Ins, Development Group, OLED Division) ;
  • Munir Badrul (Yeungnam University, School of Materials Science and Engineering) ;
  • Wibowo Rachmat Adhi (Yeungnam University, School of Materials Science and Engineering)
  • Published : 2005.10.01
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Abstract

Indium Tin Oxide (ITO) thin films were deposited from various target densities ($98.7\%\~99.6\%$) using RF magnetron sputtering. Effect of the sputtering target densities on the structural, electrical and optical properties of deposited ITO thin films was investigated. The preferable (400) crystalline orientation peak was observed on the films deposited from > $99.0\%$ target density. Higher target density produced films with higher roughness but lower resistivity. All of the deposited films showed optical transmittance more than $85\%$ in the visible wavelength region. It is necessary to use the highest target density for sputtering deposition of ITO thin films.

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References

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