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Effect of Oxygen Contents in Thermal Annealed ZnO films on Structural and Optical Properties

열처리한 ZnO 박막 내의 산소 농도 변화에 따른 구조적, 광학적 특성 연구

  • 이주영 (한국해양대학교 반도체물리) ;
  • 김홍승 (한국해양대학교 반도체물리) ;
  • 정은수 (한국해양대학교 반도체물리) ;
  • 장낙원 (한국해양대학교 전기전자공학부)
  • Published : 2005.07.01

Abstract

We studied that structural and optical properties of ZnO films depend on oxygen contents. ZnO films were deposited on Si (111) substrates at room temperature by rf sputtering system and the thickness of films was 100 nm. The ZnO films were annealed in thermal furnace for 2 h at 800 and $900^{\circ}C$ in $H_2O,\;N_2$, and air ambient gases to control oxygen contents. We used AES, PL, XRD, AFM. As our result, crystal quality and luminescence improved until O/Zn is 1. However, when O/Zn ratio Is larger than 1, the structural and optical properties were getting worse.

Keywords

References

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