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양성자 조사법에 의한 고속스위칭 사이리스터의 제조

Fabrication of a fast Switching Thyristor by Proton Irradiation Method

  • 김은동 (전력반도체연구그룹, 한국전기연구원) ;
  • 장창리 (전력반도체연구그룹, 한국전기연구원) ;
  • 김상철 (전력반도체연구그룹, 한국전기연구원) ;
  • 김남균 (전력반도체연구그룹, 한국전기연구원)
  • 발행 : 2004.12.01

초록

A fast switching thyristor with a superior trade-off property between the on-state voltage drop and the turn-off time could be fabricated by the proton irradiation method. After making symmetric thyristor dies with a voltage rating of 1,600 V from 350 $\mu$m thickness of 60 $\Omega$ㆍcm NTD-Si wafer and 200 $\mu$m width of n-base drift layer, the local carrier lifetime control by the proton irradiation was performed with help of the HI-13 tandem accelerator in China. The thyristor samples irradiated with 4.7 MeV proton beam showed a superior trade-off relationship of $V_{TM}$ = 1.55 V and $t_{q}$ = 15 $\mu$s attributed to a very narrow layer of short carrier lifetime(~1 $\mu$s) in the middle of its n-base drift region. To explain the small increase of $V_{TM}$ , we will introduce the effect of carrier compensation at the low carrier lifetime region by the diffusion current.ffusion current.t.

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참고문헌

  1. S. M. Sze, 'Physics of Semiconductor Devices', 2nd Ed., John Willey & Sons, New York, p. 35, 1981
  2. B. J. Baliga, 'Power Semiconductor Devices', PWS Publishing Co., Boston, p. 55, 1996
  3. H. Akiyama, H. Kondoh, K. Satoh, T. Nakagawa, T. Fujimoto, Y. Iwashita, and M. Inoue, 'Lifetime control in thyristors by proton irradiation', Bull. Inst. Chern. Res., Kyoto Univ.,Vol. 1, No. 1, p. 55, 1992
  4. C. Zhang, J. Waldmeyer, P. Roggwiller, and Y. Lu, 'Soft Recovery Characteristics of Punch-through Power Diodes by Proton Irradiation', Proc, 3rd International Power Electronics and Motion Control Conference (IPEMC'2000), China, p. 229, 2000.
  5. S. K. Ghandhi, 'Semiconductor Power Devices', John Wiley & Sons, New York, p, 220, 1977
  6. China Institute of Atomic Energy, Beijing, China
  7. J. F. Ziegler, J. P. Biersack, and U. Littmark, 'The stopping and range of ions in solids', Pergamon Press, New York, Vol. 1, 1985
  8. ISE-TCAD Manuals, Integrated Systems Engineering Co., Switzerland
  9. M. W. Huppi, 'Proton irradiation of silicon: complete electrical characterization of induced recombination centers', J. Appl. Phys., Vol. 68, No.6, p. 2702, 1990 https://doi.org/10.1063/1.346470