Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)
- Volume 3 Issue 1
- /
- Pages.31-34
- /
- 2004
- /
- 1738-2270(pISSN)
Development and Application of Mueller Matrix Ellipsometry
Mueller Matrix Ellipsometry 제작 및 응용
Abstract
We develop Mueller-matrix spectroscopic ellipsometry based on dual compensator configuration. This technique is very powerful for measuring surface anisotropy in nano-scale, especially when materials show depolarization. Dual-rotating compensator configuration is adopted with the rotational ratio of 5:3 originally developed by Collins et al[1]. The instrument can provide 250-point spectra over the wavelength range from 230 nm to 820 nm in one irradiance waveform with minimum acquisition time of Tc=10 s. In this work, the results obtained in transmission modes are presented for the initial attempt. We present calibration procedures to diagnose the system from the utilized data collected in transmission mode without sample. We expect that the instrument will have important applications in thin films and surfaces that have anisotropy and inhomogeneity.