Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication of Coated Conductor by Continuous PVD Methods

연속 공정 PVD 방법에 의한 Coated Conductor 제조

  • 고락길 (한국전기연구원 초전도재료연구그룹) ;
  • 정준기 (한국전기연구원 초전도재료연구그룹) ;
  • 김호섭 (한국전기연구원 초전도재료연구그룹) ;
  • 하홍수 (한국전기연구원 초전도재료연구그룹) ;
  • ;
  • 송규정 (한국전기연구원 초전도재료연구그룹) ;
  • 박찬 (한국전기연구원 초전도재료연구그룹) ;
  • 유상임 (서울대학교 재료공학과) ;
  • 문승현 (서울대학교 재료공학과) ;
  • 김영철 (부산대학교 물리학과)
  • Published : 2004.11.01
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Abstract

Continuous physical vapor deposition (PVD) method is one of many processes to fabricate long length coated conductor which is required for successful large-scale application of superconducting power devices. Three film deposition systems (pulsed laser deposition, sputtering, and evaporation) equipped with reel-to-reel(R2R) metal tape moving apparatus were installed and used to deposit multi-layer oxide thin films. Both RABiTS and IBAD texture templates are used. IBAD template consists of CeO$_2$(PLD)/YSZ(IBAD) on stainless steel(SS) metal tape, and RABiTS template has the structure of CeO$_2$/YSZ/Y$_2$O$_3$ which was continuously deposited on Ni-alloy tape using R$_2$R evaporation and DC reactive sputtering in a deposition system designed to do both processes. 0.4 m-long coated conductor with Ic(77 K) of 34 A/cm was fabricated using RABiTS template. 0.5 m and 1.1 m-long coated conductor with Ic(77 K) of 41 A/cm and 26 A/cm were fabricated using IBAD template.

Keywords

References

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