참고문헌
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- Thin Solid Films v.442 no.2 Optimization of the Electrical Properties of Magnetron Sputtered Aluminum-Doped Zinc Oxide Films for Opto-Electronic Applications C. Agashe;O. Kluth;G. Schope;H. Siekmann;J. Hupkes;B. Rech https://doi.org/10.1016/S0040-6090(03)00966-0
- Microelectronics J. v.35 Properties of Transparent Conductive ZnO:Al Thin Films Prepared by Magnetron Sputtering E.-G. Fu;D.-M. Zhuang;G. Zhang;Z. Ming;W.-F. Yang;J.-F. Liu https://doi.org/10.1016/S0026-2692(03)00251-9
- Appl. Surf. Sci. v.194 no.4 Optimisation of ZnO:Al Films by Change of Sputter Gas Pressure for Solar Cell Application D. Y. Song;A. G. Aberle;J. Xia https://doi.org/10.1016/S0169-4332(02)00137-X
- Mater. Chem. Phy. v.72 no.2 DC Reactive Sputter Deposition of ZnO:Al Thin Film on Glass J.-M. Ting;B. S. Tsai https://doi.org/10.1016/S0254-0584(01)00451-5
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- J. Eng. Sci. & Tech. v.34 Electrical and Structual Properties of ZnO Thin Films Deposited by Magnetron Sputtering S. H. Yi;J. K. Kim;H. K. Hong;Y. K. Sung
- Sur. Coat. Tech. v.176 no.2 The Effects of R. F. Power and Substrate Temperature on the Properties of ZnO Films S.-S. Lin;J.-L. Huang;D.-F. Lii https://doi.org/10.1016/S0257-8972(03)00665-0
- J. Eur. Ceram. Soc. v.24 no.6 Band Gap Energy of Pure and Al-Doped ZnO Thin Films F. K. Shan;Y. S. Yu https://doi.org/10.1016/S0955-2219(03)00490-4
- Appl. Surf. Sci. v.207 Photoluminescence of ZnO Films Excited with Light of Different Wavelength D. H. Zhang;Q. P. Wang;Z. Y. Xue https://doi.org/10.1016/S0169-4332(02)01225-4
- J. Cryst. Growth v.263 Luminescence Properties of ZnO Films Annealed in Growth Ambient and Oxygen J. Wang;G. Du;Y. Zhang;B. Zhao;X. Yang;D. Liu https://doi.org/10.1016/j.jcrysgro.2003.11.059
- Appl. Surf. Sci. v.220 Photoluminescence of ZnO Films Prepared by R. F. Sputtering on Different Substrates Q. P. Wang;D. H. Zhang;H. L. Ma;X. H. Zhang;X. J. Zhang https://doi.org/10.1016/S0169-4332(03)00751-7
- Sur. Coat. Tech. v.174-175 A Comparison of the Properties of Titanium-Based Films Produced by Pulsed and Continuous DC Magnetron Sputtering P. J. Kelly;C. F. Beevers;P. S. Henderson;R. D. Arnell;J. W. Bradley;H. Backer https://doi.org/10.1016/S0257-8972(03)00356-6
- Sur. Coat. Tech. v.174-175 Pulse-Sputter Deposition of Highly<100>-Oriented Crystalline Silicon Films F. Fenske;P. Reinig;B. Selle;W. Fuhs https://doi.org/10.1016/S0257-8972(03)00357-8
- Thin Solid Films v.392 no.2 Requirements of Power Supply Parameters for High-Power Pulsed Magnetron Sputtering U. Krause;M. List;H. Fuchs https://doi.org/10.1016/S0040-6090(01)01027-6
- Sur. Coat. Tech. v.115 Surface Defects and Generation in Reactive Magnetron Sputtering of Aluminium Oxide Thin Films K. Koski;J. Holsa;P.Juliet https://doi.org/10.1016/S0257-8972(99)00172-3
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Elements of X-Ray Diffraction(
$2^{nd}$ edition) B. D. Cullity - Pulsed and Pulsed Bias Sputtering Principles and Applications E. V. Barnat;T.-M. Lu
피인용 문헌
- A Comparative Study of CrN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Sputtering for a Polymer Electrolyte Membrane Fuel Cell (PEMFC) Metallic Bipolar Plate vol.50, pp.6, 2013, https://doi.org/10.4191/kcers.2013.50.6.390
- A Comparative Study of CrN Coatings Deposited by DC and Asymmetric Bipolar Pulsed DC Sputtering vol.47, pp.2, 2014, https://doi.org/10.5695/JKISE.2014.47.2.086
- The Characteristics of Multilayer Thin Films Deposited with Metal Thin Films (Ag, Al, Cu) vol.97-101, pp.1662-8985, 2010, https://doi.org/10.4028/www.scientific.net/AMR.97-101.1768