유도결합형 Ar 플라즈마의 압력에 따른 전기적 특성분석

Analysis of Electrical Property on Inductively Coupled Ar Plasma for Gas Pressure

  • 조주웅 (원광대 전자재료공학과) ;
  • 이영환 (원광대 전자재료공학과) ;
  • 김광수 (원광대 전자재료공학과) ;
  • 허인성 (원광대 전자재료공학과) ;
  • 최용성 (원광대 전기전자 및 정보공학부) ;
  • 박대희 (원광대 전기전자 및 정보공학부)
  • 발행 : 2004.03.01

초록

Low-Pressure inductively coupled RF discharge sources have important industrial applications mainly because they can provide a high-density electrodeless plasma source with low ion energy and low power loss. In an inductive discharge, the RF power is coupled to the plasma by an electromagnetic interaction with the current flowing in a coil. In this paper, the experiments have been focussed on the electric characteristic and carried out using a single Langmuir probe. The internal electric characteristics of inductively coupled Ar RF discharge at 13.56(MHz) have been measured over a wide range of power at gas pressure ranging from 1∼70(mTorr).

키워드

참고문헌

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