대한전자공학회논문지SD (Journal of the Institute of Electronics Engineers of Korea SD)

대한전자공학회 (The Institute of Electronics and Information Engineers)
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SOI MOSFET의 모든 동작영역을 통합한 해석적 표면전위 모델

A Unified Analytical Surface Potential Model for SOI MOSFETs

  • 유윤섭 (한경대학교 정보제어공학과)
  • 발행 : 2004.02.01
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⟨ 이전 논문 다음 논문 ⟩

초록

본 논문에서는 부분공핍(partially-depleted : PD) 영역과 완전공핍(fully-depleted : FD) 영역을 나누는 임계 전면 게이트 전압 V/sub c/의 해석적 표현을 이용해서 PD 영역과 FD 영역의 천이를 정확히 설명하는 해석적 표면전위 모델(analytical surface potential model)을 소개한다. 이 모델은 모든 동작영역(subthreshold에서 strong inversion까지)에서 유효하고 반복 계산 절차 (iteration procedure)인 수치 해석적 방법보다 훨씬 짧은 계산시간이 걸린다. 이 모델에 기초한 charge sheet 모델이 모는 동작영역에 유효한 드레인 전류의 단일 공식을 유도하는데 사용된다. 대부분의 secondary 효과들이 charge sheet 모델에 쉽게 포함되고 그 모델의 결과들은 수치해석 결과와 실험 결과를 비교적 정확히 일치한다. 세 가지의 smoothing 함수가 사용될지 라도 표면전위 미분 값은 연속이다 더욱 중요한 점은 smoothing 함수에 사용된 파라미터들은 공정 파라미터들에 크게 의존하지 않는다.

We present a new unified analytical front surface potential model, which can accurately describe the transitions between the partially-depleted (PD) and the fully-depleted (FD) regimes with an analytical expression for the critical voltage V$_{c}$ delineating the PD and the FD region. It is valid in all regions of operation (from the sub -threshold to the strong inversion) and has the shorter calculation time than the iterative procedure approach. A charge sheet model based on the above explicit surface potential formulation is used to derive a single formula for the drain current valid in all regions of operation. Most of the secondary effects can be easily included in the charge sheet model and the model accurately reproduces various numerical and experimental results. No discontinuity in the derivative of the surface potential is found even though three types of smoothing functions are used. More importantly, the newly introduced parameters used in the smoothing functions do not strongly depend on the process parameter.

키워드

참고문헌

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