Corrosion Science and Technology

  • 제2권4호
  • /
  • Pages.189-193
  • /
  • 2003
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  • 1598-6462(pISSN)
  • /
  • 2288-6524(eISSN)
한국부식방식학회 (The Corrosion Science Society of Korea)
권호 표지

A Study on the Plasma Etching of Ru Electrodes using $O_2/Cl_2$ Helicon Discharges

  • 발행 : 2003.08.01
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초록

The Ru etching using $O_2/C_{12}$ plasmas has been studied by employing the helicon etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with varied process variables were investigated. The Ru etching slope at the optimized etching condition was measured to be $84^{\circ}$. We reveal that the Ru etching using $O_2/C_{12}$ plasma generates the $RuO_2$ thin film. Possible mechanism of Ru etching is discussed.

키워드

참고문헌

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