Spin Etcher의 진동 분석

Vibration Analysis of Spin Etcher

  • 임경화 (한국기술교육대학교 제어시스템공학과) ;
  • 이은경 (한국기술교육대학교 대학원 기계공학과) ;
  • 조중근 ((주)한국디엔에스)
  • 발행 : 2003.03.01

초록

Spin etcher can process frontside and backside on the wafer, which is used for etching, stripping, cleaning and wafer reclamation. A new generation of spin etchers has been designed to meet 300mm wafer processing. The larger header and higher spin speed make vibration problem a severe problem in developing equipments. This study shows schematic process of solving practical vibration problems, where it is required to analyze the principal ca uses of vibration problem and find out the method of vibration reduction in spin etcher. The vibration under normal operation is measured in time domain and is analyzed in frequency domain. And modal parameters are obtained through modal test. Using the modal parameters from experiments, the model of finite element method is formulated. From diagnosis using many measurements and analyses, it can be shown that main cause of vibration is unbalance of head.

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