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자가 산부식 프라이머 시스템 사용시 인산에 의한 부가적인 산부식이 미세누출에 미치는 영향

THE EFFECT OF ADDITIONAL ENAMEL ETCHING ON MICROLEAKAGE OF THE ADHESION OF SELF-ETCHING PRIMER SYSTEM

  • 윤정진 (단국대학교 치과대학 보존학교실) ;
  • 민경산 (단국대학교 치과대학 보존학교실) ;
  • 홍찬의 (단국대학교 치과대학 보존학교실)
  • Yoon, Jung-Jin (Department of Conservative Dentistry, College of Dentistry, Dankook University) ;
  • Min, Kyung-San (Department of Conservative Dentistry, College of Dentistry, Dankook University) ;
  • Hong, Chan-Ui (Department of Conservative Dentistry, College of Dentistry, Dankook University)
  • 발행 : 2003.09.01

초록

The purpose of this study is to evaluate the effect of additional enamel etching with phosphoric acid on the microleakage of the adhesion of self-etching primer system. Class V cavity($4mm{\times}3mm{\times}1.5mm$) preparations with all margins in enamel were prepared on buccal surface of 42 extracted human upper central incisor teeth. Prepared teeth were randomly divided into 3 groups. Group 1:no additional pretreatment with 37% phosphoric acid (NE). Group 2:additional pretreatment with 37% phosphoric acid for 10 seconds (E10s). Group 3:additional pretreatment with 37% phosphoric acid for 20 seconds (E20s). The adhesives(Clearfil SE $Bond^{\circledR}$, Kuraray, Osaka, Japan) and composite resins(Clearfil $AP-X^{\circledR}$, Osaka, Kuraray, Japan) were applied following the manufacturer's instructions. All the specimens were finished with the polishing disc(3M dental product, St Paul, MN, USA), thermocycled for 500 cycles between $5^{\circ}C$ and $55^{\circ}C$ and resected apical 3-mm root. 0.028 stainless steel wire was inserted apically into the pulp chamber of each tooth and sealed into position with sticky wax. Surrounding tooth surface was covered with a nail varnish 2 times except areas 1mm far from all the margins. After drying for one day, soaked the samples in the distilled water. Microleakage was assessed by electrochemical method(System 6514, $Electrometer^{\circledR}$), Keithley, USA) in the distilled water. In this study, the microleakage was the lowest in group 1 (NE) and the highest in group 3(E20s)(NE

키워드

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