참고문헌
- Y. Kobayashi, N. Tanaka, H. Okano, and K. Takeuchi, 'Characteristics of surface acoustic wave on A1N thin films', Jpn. J. Appl.Phys., Vol. 34, pp.2668-2673, 995 https://doi.org/10.1143/JJAP.34.2668
- K. Yamanouchi, N. Sakurai, and T. Sato, 'SAW propagation characteristics and fabrication technology of piezoelectric thin film/diamond structure', IEEE Ultrasonics Symp., pp.351-354, 1989 https://doi.org/10.1109/ULTSYM.1989.67007
- M. B. Assouar, O. Elmazria, L. Le Brizoual, and P. Alnot, 'Reactive DC magnetron sputtering of alum inum nitride films for surface acoustic wave devices', Diamond Relat. Mater.,Vol. 11, pp.413-417, 2002 https://doi.org/10.1016/S0925-9635(01)00708-7
- D. Liufu and K.C. Kao, 'Piezoelectric, dielectric, and interfacial properties of aluminum nitride films', J. Vac. Sci. Technol.A16, pp.2360, 1998 https://doi.org/10.1116/1.581352
- X. H. Xu, H. S. Wu, C. J. Zhang, Z. H. Jin, 'Morph ological properties of A1N piezoelectric thin film dep osited by DC reactive magnetron sputtering', Thin solid films, Vol. 388, pp.62-67, 2001 https://doi.org/10.1016/S0040-6090(00)01914-3
- J. K. Kim and S. H. Jeong, 'Effects of deposition parameters on A1N film growth using reactive DC magnetron sputtering', J. Korea Physical Society, Vol.38, Nol, pp.19-24, 2001
- S. Uchiyama, Y. Ishigami, M. Ohta, M. Niigaki, H. Kan, Y. Nakanish, and T. Yamaguchi, 'Growth of AIN films by magnetron sputtering', J. Crystal Growth, Vol.189-190, pp.448-451, 1998 https://doi.org/10.1016/S0022-0248(98)00328-5
- J. H. Lee, W. M. Kim, T. S. Lee, M. K. Chung, B. Cheong, and S. G. Kim, 'Mechanical and adhesion properties of A1/A1N multilayered thin films', Surf. Coat. Tech., Vol. 133-134, pp.220-226, 2000 https://doi.org/10.1016/S0257-8972(00)00937-3
- W. Y. Chiu, C. H. Wu, H. L. Kao, and Erik S. Jeng, 'The optical properties and applications of A1N thin films prepared by a helicon sputtering system', J. Vac. Sci. Tech. Vol. A20(3), pp.843-847, 2002 https://doi.org/10.1116/1.1470512
- R. S. Naik, R. Rief, J.J. Lutsky, and C. G. Sodini, 'Low-temperature depostion of highly textured alu minum nitride by direct magnetron sputtering for applications in thin-film resonators', J. Electrochem. Soc., Vol.146, pp.691-696, 1999 https://doi.org/10.1149/1.1391664
- H. M. Liaw and F. S. Hickernell, 'SAW Character istics of Sputtered Aluminum Nitride on Silicion and Gallium Arsinide', IEEE Ultrasonics Symp., pp.375-377, 1994 https://doi.org/10.1109/ULTSYM.1994.401613
- H. M. Liaw and F. S. Hickernell, 'The structural and acoustic properties of sputtered aluminum nitride on silicon', IEEE Ultrasonic Symp. pp.543-546, 1995 https://doi.org/10.1109/ISAF.1994.522425
- J. B. Lee, M. H. Lee, H. J. Lee, S. M. Chang, C. K. Park, S. U. Hong, and J. S. Park, 'Effects of lattice mismatches between ZnO films and substrate materials on the characteristic of SAW devices', ICEE 2002, Vol.3, pp.1121-1123, 2002