한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제16권8호
  • /
  • Pages.731-735
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  • 2003
  • /
  • 1226-7945(pISSN)
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  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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초고속 광변조기 제작을 위한 LiNbO3도파로의 건식식각

Dry Etching of patternedLiNbO3Waveguides for the High-speed Optical Modulator fabrication

  • 양우석 (전자부품연구원 광부품연구센터) ;
  • 김우경 (전자부품연구원 광부품연구센터) ;
  • 이승태 (단국대학교 전자공학과) ;
  • 박우정 (성균관대학교 신소재공학과) ;
  • 장현수 (성균관대학교 정보통신공학부) ;
  • 윤대호 (성균관대학교 신소재공학과) ;
  • 이한영 (전자부품연구원 광부품연구센터)
  • 발행 : 2003.08.01
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초록

Ti-indiffused LiNbO$_3$waveguide have been used to various high speed optical device based on electro-optic effect such as modulators, switches, and sensor, etc. In order to high speed modulation of optical modulator have, one of the further devices, needed to increasing of electrode surrounding air by LiNbO$_3$dry etching because of impedance matching for optical and RF phase velocity between waveguide and electrode. We studied property of LiNbO$_3$dry etching after waveguide patterning lot optical modulation by using neutral loop discharge (NLD) plasma.

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참고문헌

  1. J. Mater. Res. v.13 Surface precipitates on single crystal LiNbO₃after dry-etching by CHF₃plasma K.Shima;N.Mitsugi;H.Nagata https://doi.org/10.1557/JMR.1998.0068
  2. Surface and Coating Technol. v.74 Reactive ion beam etching of lithium tantalate and its application for pyroelectric infrared detectors C.plehnert;V.Norkus;S.Mohling;A.Hayes https://doi.org/10.1016/0257-8972(94)08207-3
  3. J. Lightwave Technol. v.10 Wet etching of proton-exchanged lit hum niobate-A novel proceeding technique F.Laurell;J.Webjorn;G.Arvidsson;S.Seki https://doi.org/10.1109/50.184899
  4. IEEE Phon. Technol. v.10 Lithum niobate ridge waveguides by nikel diffusion and proton-exchanged wet etching W.L.Chen;R.S.Chen;J.H.Lee;W.S.Wang
  5. IEEE Phon. Technol. Lett. v.5 Highly efficient 40-GHz band width Ti:LiNbO₃optical modulator employing ridge structure K.Noguchi;O.Mitomi;K.Kawano;M.Yanagibashi https://doi.org/10.1109/68.185058
  6. J. Crystal Growth v.187 Growth of crystalline LiF on CF₄plasma etched LiNbO₃substrates H.Nagata;N.Mitrugi;K.Shima;M.Tamai;E.M.Haga https://doi.org/10.1016/S0022-0248(98)00009-8