Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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The Effect of Pulse Plating on the Current Efficiency in Trivalent Chromium Bath

3가크롬 도금욕에서 펄스도금조건이 전류효율에 미치는 영향

  • 황경진 (한국과학기술연구원 금속공정연구센터) ;
  • 안종관 (한국지질자원연구원 자원활용연구부) ;
  • 이만승 (목포대학교 공과대학 신소재공학과) ;
  • 오영주 (한국과학기술연구원 금속공정연구센터)
  • Published : 2003.04.01
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Abstract

In order to investigate the effects of pulse plating conditions on the electrodeposition of trivalent chromium, electroplating experiments from bath with low concentration of trivalent chromium were performed. The variation of current efficiency of chromium electroplating with the electroplating conditions was explained. The maximum current efficiency of pulse plating is 6.4 times as high as that of direct plating at the same mean current density The nodular size increased with pulse plating time and the pulse frequency.

Keywords

References

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