Journal of Sensor Science and Technology (센서학회지)

The Korean Sensors Society (한국센서학회)
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Design and Fabrication of 32x32 Foveated CMOS Retina Chip for Edge Detection with Local-Light Adaptation

국소 광적응 기능을 가지는 윤곽검출용 32x32 방사형 CMOS 시각칩의 설계 및 제조

  • Park, Dae-Sik (School of Electronic and Electrical Engineering, Kyungpook National Univ.) ;
  • Park, Jong-Ho (School of Electronic and Electrical Engineering, Kyungpook National Univ.) ;
  • Kim, Kyung-Moon (School of Electronic and Electrical Engineering, Kyungpook National Univ.) ;
  • Lee, Soo-Kyung (School of Electronic and Electrical Engineering, Kyungpook National Univ.) ;
  • Kim, Hyun-Soo (School of Electronic and Electrical Engineering, Kyungpook National Univ.) ;
  • Kim, Jung-Hwan (School of Electronic and Electrical Engineering, Kyungpook National Univ.) ;
  • Lee, Min-Ho (School of Electronic and Electrical Engineering, Kyungpook National Univ.) ;
  • Shin, Jang-Kyoo (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
  • 박대식 (경북대학교 전자전기공학부) ;
  • 박종호 (경북대학교 전자전기공학부) ;
  • 김경문 (경북대학교 전자전기공학부) ;
  • 이수경 (경북대학교 전자전기공학부) ;
  • 김현수 (경북대학교 전자전기공학부) ;
  • 김정환 (경북대학교 전자전기공학부) ;
  • 이민호 (경북대학교 전자전기공학부) ;
  • 신장규 (경북대학교 전자전기공학부)
  • Published : 2002.03.30
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Abstract

A $32{\times}32$ pixels foveated (linear-polar) structure retina chip with the function of local-light adaptation for edge detection has been designed and fabricated using CMOS technology. Human retina can detect a wide range of light intensity. In this study, we use the biologically-inspired visual signal processing mechanism that consists of photoreceptors, horizontal cells, and bipolar cells in order to implement the function of edge detection in the retina chip. For a local-light adaptive function, the size of receptive field is changed locally according to the input light intensity. The spatial distribution of sensing pixels in the foveated retina chip has the advantages of selective reduction of image data and good resolution in central part to carry out the elaborate image processing with still enough resolution in the outer parts. The designed chip has been fabricated using standard $0.6\;{\mu}m$ double-poly triple-metal CMOS technology and optimized using HSPICE simulator.

국소 광적응 기능을 가지는 윤곽검출용 시각칩을 픽셀수 $32{\times}32$의 방사형 구조로 CMOS 공정기술을 이용하여 설계 및 제조하였다. 생체의 망막은 넓은 범위의 입력 광강도에 대해서 물체의 윤곽을 검출할 수 있다. 본 연구에서는 시세포, 수평세포, 쌍극세포로 이루어진 망막의 윤곽검출 기능을 모델링하여 윤곽검출용 인공시각칩을 설계하였다 국소 광적응을 위해 입력 광강도에 따라 수용야의 크기를 국소적으로 바뀌게 하였다. 아울러 단위셀을 방사형으로 배치함으로써 영상데이터의 양을 감소시킴과 동시에 칩의 중심부분으로 갈수록 해상도가 높아지도록 설계하였다. 설계된 칩은 $0.6\;{\mu}m$ double-poly triple-metal 표준 CMOS 공정기술을 이용하여 제조되었으며, HSPICE 시뮬레이션으로 성능을 최적화 시켰다.

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References

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