참고문헌
- H. W. Drawin, Mass spectrometry of plasma in plasma diagnostics (AIP, New York, 1995)
- M. Tuszewski, J.T. Scheuer and J. A. Tobin, 'Composition of the oxygen plasma from two inductively coupled sources', J. Vac. Sci. Technol. A13, 839 (1995) https://doi.org/10.1116/1.579838
-
F. Becker, I. W. Rangelow, K. Masseli, and R. Kassing, 'Diagnostic on
$N_2$ plasma with an energy resolved quadrupole mass spectrometer at the powered electrode in a eactive ion etching system: ion energy distribution of$N_2^{+}$ and$N^{+}$ ', Surf. Coatings Technol. 74/75, 485 (1995) https://doi.org/10.1016/0257-8972(95)08251-4 - E. Kusano, T. Saitoh, T. Kobayashi, K. Fukushima, N. Kikuchi, H. Nantom, and A. Kinbara, 'Effect of coil dc potectial on ion energy distribution measured by an energy-resolved mass spectrometer in ionized physical vapor deposition', J. Vac. Sci. Technol. A17, 2360 (1999) https://doi.org/10.1116/1.581773
- Sz. Katai, Z. Tass, L. Bori, Gy. Hars, and P. Deak, 'Ion beam mass spectrometer for compositional analysis of plasma assisted surface processes in the pressure range of 1-50mbar' Rev. Sci. Instr. 70, 3324 (1999)
- J. R. Conrad, J. L. Radtke, R. A. Dodd, F. J. Worzala, and N. C. Tran, 'Plasma source ion implantation technique for surface modification of materials', J. Appl. Phys. 62, 4591 (1987) https://doi.org/10.1063/1.339055
- B. Y. Tang, R. P. Fetherston, M. Shamin, R. A. Breun, A. Chen, and J. R. Conrad, 'Measurement of ion species ratio in the plasma source ion implantation process', J. Appl. Phys. 73, 4176 (1993) https://doi.org/10.1063/1.352852
- J. W. Coburn, 'Mass spectrometric studies of positive ions in RF glow discharges', Thin Solid Films 171, 65 (1989) https://doi.org/10.1016/0040-6090(89)90034-5
-
M. Zarrabian, C. Leteinturier, and G. Turban, 'Mass spectrometric investigations on
$CH_4$ plasmas obtained from a dual electron cyclotron resonance-radio frequency discharge', Plasma Sources Sci. Technol. 7, 607 (1998) - E. Y. Wang, L. Schmitz, Y. Ra, B. LaBombard, and R. W. Conn, 'All omegatron mass spectrometer for plasma ion species analysis', Rev. Sci. Instrum. 61, 2155 (1990) https://doi.org/10.1063/1.1141382
- M. Tuszewski, 'A compact mass spectrometer for plasma discharge ion analysis', Rev. Sci. Instrum. 67, 2215 (1996) https://doi.org/10.1063/1.1147039
- S. Humphries, Jr., Principles of Charged particle acceleration (John Wiley & Sons, New York, 1986)
- E. W. McDaniel, Collision phenomena in ionized gases (John Wiley & Sons, New York, 1986)
- 김광훈, S.A. Nikiforov, 이홍식, 임근희, '플라즈마 질소 이온주입한 오스테나이트 스테인레스 강의 표면특성', 1999년도 대한전기학회 하계학술대회 논문집, pp. 2253-2255
- G. H. Kim, G. H. Rim, and S. A. Nikiforov, 'Monitoring of ion mass composition in plasma immersion ion implantation', Surf. Coatings Technol. 136, 255 (2001) https://doi.org/10.1016/S0257-8972(00)01026-4
- I. D. Sudit and F. F. Chen, 'RF compensated probes for high-density discharges', Plasma Sources Sci. Technol. 3 162 (1994) https://doi.org/10.1088/0963-0252/3/2/006