The Transactions of the Korean Institute of Electrical Engineers C (대한전기학회논문지:전기물성ㆍ응용부문C)

The Korean Institute of Electrical Engineers (대한전기학회)
권호 표지

Fabrication of Ion Mass Analyzer and its Operational Characteristics

이온질량분석기의 제작과 그 동작특성

  • 김광훈 (한국전기연구원 플라즈마 가속기 연구단) ;
  • 최영욱 (한국전기연구원 전기물리그룹) ;
  • 이홍식 (한국전기연구원 전기물리그룹) ;
  • 임근희 (한국전기연구원 산업전기연구단) ;
  • Published : 2001.08.01
Download PDF
⟨ Previous Next ⟩

Abstract

The information of the ion composition in plasma applications is required to characterize a plasma. A better understanding of ion species composition ratio and its spacial distribution, etc. is thus necessary in plasma-related processes, such as thin film deposition, plasma-based ion implantation, semiconductor processing, and so on. In this research, a compact ion mass analyzer that is based on magnetic sector analyzer was developed and its operational characteristics were studied in nitrogen plasma.

Keywords

References

  1. H. W. Drawin, Mass spectrometry of plasma in plasma diagnostics (AIP, New York, 1995)
  2. M. Tuszewski, J.T. Scheuer and J. A. Tobin, 'Composition of the oxygen plasma from two inductively coupled sources', J. Vac. Sci. Technol. A13, 839 (1995) https://doi.org/10.1116/1.579838
  3. F. Becker, I. W. Rangelow, K. Masseli, and R. Kassing, 'Diagnostic on $N_2$ plasma with an energy resolved quadrupole mass spectrometer at the powered electrode in a eactive ion etching system: ion energy distribution of $N_2^{+}$ and $N^{+}$', Surf. Coatings Technol. 74/75, 485 (1995) https://doi.org/10.1016/0257-8972(95)08251-4
  4. E. Kusano, T. Saitoh, T. Kobayashi, K. Fukushima, N. Kikuchi, H. Nantom, and A. Kinbara, 'Effect of coil dc potectial on ion energy distribution measured by an energy-resolved mass spectrometer in ionized physical vapor deposition', J. Vac. Sci. Technol. A17, 2360 (1999) https://doi.org/10.1116/1.581773
  5. Sz. Katai, Z. Tass, L. Bori, Gy. Hars, and P. Deak, 'Ion beam mass spectrometer for compositional analysis of plasma assisted surface processes in the pressure range of 1-50mbar' Rev. Sci. Instr. 70, 3324 (1999)
  6. J. R. Conrad, J. L. Radtke, R. A. Dodd, F. J. Worzala, and N. C. Tran, 'Plasma source ion implantation technique for surface modification of materials', J. Appl. Phys. 62, 4591 (1987) https://doi.org/10.1063/1.339055
  7. B. Y. Tang, R. P. Fetherston, M. Shamin, R. A. Breun, A. Chen, and J. R. Conrad, 'Measurement of ion species ratio in the plasma source ion implantation process', J. Appl. Phys. 73, 4176 (1993) https://doi.org/10.1063/1.352852
  8. J. W. Coburn, 'Mass spectrometric studies of positive ions in RF glow discharges', Thin Solid Films 171, 65 (1989) https://doi.org/10.1016/0040-6090(89)90034-5
  9. M. Zarrabian, C. Leteinturier, and G. Turban, 'Mass spectrometric investigations on $CH_4$plasmas obtained from a dual electron cyclotron resonance-radio frequency discharge', Plasma Sources Sci. Technol. 7, 607 (1998)
  10. E. Y. Wang, L. Schmitz, Y. Ra, B. LaBombard, and R. W. Conn, 'All omegatron mass spectrometer for plasma ion species analysis', Rev. Sci. Instrum. 61, 2155 (1990) https://doi.org/10.1063/1.1141382
  11. M. Tuszewski, 'A compact mass spectrometer for plasma discharge ion analysis', Rev. Sci. Instrum. 67, 2215 (1996) https://doi.org/10.1063/1.1147039
  12. S. Humphries, Jr., Principles of Charged particle acceleration (John Wiley & Sons, New York, 1986)
  13. E. W. McDaniel, Collision phenomena in ionized gases (John Wiley & Sons, New York, 1986)
  14. 김광훈, S.A. Nikiforov, 이홍식, 임근희, '플라즈마 질소 이온주입한 오스테나이트 스테인레스 강의 표면특성', 1999년도 대한전기학회 하계학술대회 논문집, pp. 2253-2255
  15. G. H. Kim, G. H. Rim, and S. A. Nikiforov, 'Monitoring of ion mass composition in plasma immersion ion implantation', Surf. Coatings Technol. 136, 255 (2001) https://doi.org/10.1016/S0257-8972(00)01026-4
  16. I. D. Sudit and F. F. Chen, 'RF compensated probes for high-density discharges', Plasma Sources Sci. Technol. 3 162 (1994) https://doi.org/10.1088/0963-0252/3/2/006