한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제34권5호
- /
- Pages.516-521
- /
- 2001
- /
- 1225-8024(pISSN)
- /
- 2288-8403(eISSN)
The Development of Cl-Plasma Etching Procedure for Si and SiO$_2$
- Kim, Jong-Woo (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Jung, Mi-Young (Department of Physics, Sunmoon University) ;
- Park, Sung-Soo (Department of Physics, Sunmoon University) ;
-
Boo, Jin-Hyo
(Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
- 발행 : 2001.10.01
초록
Dry etching of Si wafer and
키워드