Journal of Surface Science and Engineering (한국표면공학회지)
- Volume 34 Issue 5
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- Pages.516-521
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- 2001
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
The Development of Cl-Plasma Etching Procedure for Si and SiO$_2$
- Kim, Jong-Woo (Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Jung, Mi-Young (Department of Physics, Sunmoon University) ;
- Park, Sung-Soo (Department of Physics, Sunmoon University) ;
- Boo, Jin-Hyo (Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
- Published : 2001.10.01
Abstract
Dry etching of Si wafer and
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