Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 34 Issue 5
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- Pages.510-515
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- 2001
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
Growth and characterization of BON thin films prepared by low frequency RF plasma enhanced MOCVD method
- Chen, G.C. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
- Lim, D.-C. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
- Lee, S.-B. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
- Hong, B.Y. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
- Kim, Y.J. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University) ;
- Boo, J.-H. (Center for Advanced Plasma Surface Technology, Sung Kyun Kwan University)
- Published : 2001.10.01
Abstract
It was first time that low frequency R.F. derived plasma enhanced MOCVD with frimethylborate precursor was used to fabricate a new ternary compound
Keywords