강유전체 박막의 특성에 따른 Quasi-MFISFET 소자의 특성

Characteristics of Quasi-MFISFET Device with Various Ferroelectric Thin Films

  • 이국표 (인하대학교 전자재료공학과) ;
  • 윤영섭 (인하대학교 전자재료공학과) ;
  • 강성준 (여수대학교 반도체·응용물리학과)
  • 발행 : 2001.03.01

초록

PLZT(10/30/70), PLT(10) 및 PZT(30/70) 와 같은 강유전체 박막의 이력곡선을 field-dependent polarization 모델을 이용하여 시뮬레이션하고, 측정한 실험적 결과와 비교, 분석하였다. PZT(30/70) 박막의 경우, 5V 이상의 인가전압에서 분극의 포화현상이 둔감하게 나타나고 시뮬레이션 값과의 차이도 심해 강유전체 분극이 순수한 dipole 외에도 다양한 전하의 영향을 받아 형성된다는 사실을 알 수 있다. 또, quasi-MFISFET 소자의 드레인 전류는 field-dependent polarization 모델의 강유전체 이력곡선에서 얻은 파라미터를 square-law FET 모델에 적용시켜 효과적으로 추출하였고, 모델링 결과는 실험값과 유사하였다. 그리고, quasi-MFISFET 소자의 gate 에 -10V의 'write' 전압을 인가한 상태에서 PZT(30/70) 박막을 사용한 경우, PLZT(10/30/70), PLT(10) 박막 보다 빨리 채널이 형성되었는데, 그 원인은 강유전체 박막에 따른 retention 특성에서 PZT(30/70) 박막의 분극 감소가 PLZT(10/30/70), PLT(10) 박막의 분극 감소 보다 약 3∼4 배 이상 크다는 점에서 찾을 수 있다.

Hysteresis loops of the ferroelectric thin films such as PLZT(10/30/70), PLT(10) and PZT(30/70) was simulated using the field-dependent polarization model and compared to the measured loops. In case of PZT(30/70) thin film, as the real saturation or polarization at the applied voltage or larger than 5V appears slack and its value is quite different from the simulated one, it is deduced that the ferroelectric polarization of PZT(30/70) is generated not only by the pure dipoles but also by various electric charges. The drain current of quasi-MFISFET is expressed by using the square-law FET and field-dependent polarization models. The modeling results are analogous to the experimental values. The channel of quasi-MFISFET using PZT(30/70) forms more quickly compared to that of quasi-MFISFET using PLZT(10/30/70) or PLT(10) in the state of 'write' gate voltage of -10V. This may be because the decrease rate of the polarization in the PZT(30/70) thin film is 3~4 times more rapid than that of the polarization in the PLZT(10/30/70) or the PLT(10) thin film in the retention characteristics.

키워드

참고문헌

  1. T. Sumi, 'Ferroelectric Nonvolatile Memory Technology and its Applications', International Conference on Solid State Devices and Materials, pp. 518-520, 1995
  2. S. Sinharoy, H. Buhay, D. R. Lampe and M. H. Francombe, 'Integration of Ferroelectric Thin Films into Nonvolatile Memories', J. Vac Sci. Technol. A, vol. 10, pp. 1554-1560, 1992 https://doi.org/10.1116/1.578044
  3. K. Ashikaga and T. Ito, 'Analysis of Memory Retention Characteristics of Ferroelectric Field Effect Transistors Using a Simple Metal-Ferroelectric-Metal- Insulator-Semiconductor Structure', J. Appl. Phys., vol. 85, N. 10, pp. 7471-7476, 1999 https://doi.org/10.1063/1.369381
  4. Y. Fuiirrori, T. Nakamura and A. Kamisawa, 'Properties of Ferroelectric Memory FET Using Sr2(Ta, Nb)2O7 Thin Film', Jpn J Appl. Phys., vol. 38, N. 4B, pp. 2285-2288, 1999 https://doi.org/10.1143/JJAP.38.2285
  5. E. Tokumitsu, 'Nonvolatile Ferroelectric Field-Effect-Transistors Using $SrBi_2Ta_2O_9/Pt/SrTa_2Q_6/SiON/Si$ Structures', Appl. Phys. Lett., vol. 75, N. 4, pp. 575-577, 1999 https://doi.org/10.1063/1.124446
  6. J. A Gonzalo, Effective Field Approadi to Prase Transitions and Some Applications to Ferroelectrics, World Scientific Lecture Notes in Physics, vol. 25, World Scientific, New Jersey, 1991.
  7. F. K. Chai, J. R Brews, R. D. Schrimpf and D. P. Birnie III, 'Relating Local Electric Field in a Ferroelectric Capacitor to Externally Measureable Voltages', Proceedings cf the 9th Int. Symp. on Applications of Ferroelectrics, pp. 83-86, 1994
  8. S. M. Sze, Physics cf Semiconductor Devices,second edition, John Wiley & Sons, New York, Chapter 8, 1981
  9. R. R. Pierret, Field Effect Devices, second edition, Addison-Wesley Publishing Company, Inc., USA, Chapter 2-3, 1990
  10. D. K. Schroder, Adixmced MOS Devices, Addison-Wesley Publishing Company, Inc., USA, Chapter 1, 1987.
  11. Seong Jun Kang, Dong Hoon Chang and Yung Sup Yoon, 'Characteristics of PLT Thin Films Various Pb/La Ratios', Superficies y Vac., vol. 9, pp. 150-153, 1999
  12. Seong Jun Kang, Dong Hoon Chang and Yung Sup Yoon, 'Fatigue and Dielectric Properties of the (Pb,La)$TiO_3$ Thin Films with Various La Concentrations', To be published in Thin Solid Films https://doi.org/10.1016/S0040-6090(00)01104-4
  13. J. P. Han, X. Guo and T. P. Ma, 'Memory Effects of $SrBi_2Ta_2O_9$ Capacitor on Silicon with a Silicon Nitride Buffer', Integrated Ferro-electrics, vol. 22, pp. 213-221, 1998
  14. J. J. Lee and S. B. Desu 'Retention and Imprint Properties of Ferroelectric Thin Films', phys. state. sol. vol, (a)151, pp. 171-182 (1995) https://doi.org/10.1002/pssa.2211510120