Transactions on Electrical and Electronic Materials
- Volume 2 Issue 2
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- Pages.21-25
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- 2001
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- 1229-7607(pISSN)
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- 2092-7592(eISSN)
The Effect of Pyrazine on TMAH:IPA Single-crystal Silicon Anisotropic Etching Properties
- Gwiy-Sang Chung (School of Information and System Engineering, Dongseo University) ;
- Tae-Song Kim (Microsystem Research Center, Korea Institute of Science and Technology (KIST))
- Published : 2001.06.01
Abstract
This paper presents the effect of pyrazine on tetramethylammonium hydroxide (TMAH):isopropyl alcohol (IPA) single-crystal silicon anisotropic etching properties. With the addition of IPA to TMAH solutions, etching characteristics are exhibited an improvement in flatness on the etching front and a reduction in undercutting, but the etch rate on (100) silicon is decreased. The (100) silicon etch rate is improved by the addition of pyrazine. An etch rate on (100) silicon of 0.8