Transactions on Electrical and Electronic Materials
- 제2권1호
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- Pages.22-26
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- 2001
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- 1229-7607(pISSN)
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- 2092-7592(eISSN)
Effects on Heat Treatment Methods in Indium-Tin-Oxide Films by DC Magnetron Sputter of Powder Target
- Kim, H.H. (Electronic Department, Doowon Institute of Technology) ;
- Shin, J.H. (Optical and Electronic materials Division, Agency for Technology and Standards) ;
- Baek, J.Y. (Optical and Electronic materials Division, Agency for Technology and Standards) ;
- Shin, S.H. (Optical and Electronic materials Division, Agency for Technology and Standards) ;
- Park, K.J. (Optical and Electronic materials Division, Agency for Technology and Standards)
- 발행 : 2001.03.01
초록
ITO (Indium-tin-oxide) thin films were deposited on glass substrates by a dc magnetron sputtering system using ITO powder target. The methods of heat treatment are important factor to obtain high quality ITO films with low electrical resistivity and good optical transmittance. Therefore, both methods of the substrate temperature and post-deposition annealing temperature have been compared on the film structural, electrical and optical properties. A preferred orientations shifts from (411) to (222) peak at annealing temperature of 200