Fabrication of Tungsten Probe using Electro-Chemical Etching

전기화학적 에칭을 이용한 텅스텐 미세 탐침 가공

  • 인치현 ((주) 대우전자) ;
  • 김규만 (서울대학교 정밀기계설계 공동연구소) ;
  • 주종남 (서울대학교 기계항공공학부)
  • Published : 2001.02.01

Abstract

Tungsten probe is the most important part of a probe card, which is widely used for the performance test of wafer chips. Electro chemical etching becomes an exclusive choice for mass production of the tungsten probes. In the mass production, not only the shape of the probe but also the shape distribution of machined probes is important. A new method is proposed for the mass production of the tungsten probes. Tungsten wires are separated by a distance, and dipped into electrolyte. The dipping rate is controlled to shape the probes. Several experimental tests are performed to study the machining characteristics. From the test results, machining parameters including electrical conditions and anode position showed significant influences on the shape, repeatability, precision and quality of sharp tips.

Keywords

References

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