Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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C-axis Orientation of ZnO Thin Films Prepared by DC Facing Targets Sputtering Method

직류 대향타겟스퍼터링법으로 제작된 ZnO 박막의 c-축 배향성

  • 금민종 (경원대학교 공대 전기전자공학부) ;
  • 손인환 (신성대학 전기과) ;
  • 공석현 (경원대학교 공대 전기전자공학부) ;
  • 성하윤 (경원대학교 공대 전기전자공학부) ;
  • 김경환 (경원대학교 공대 전기전자공학부)
  • Published : 2000.02.01
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Abstract

We prepared ZnO thin film with Facing Targets Sputtering system that can deposit thin film in plasma-free situation and change the deposition condition in wide range. And prepared thin film's c-axis orientation and grain size were analyzed by XRD (x-ray diffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.

Keywords

References

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