한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제32권3호
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- Pages.385-388
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- 1999
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
Electron field emission from various CVD diamond films
- Usikubo, Koji (Graduate school, Chiba Institute of Technology) ;
- Sakamoto, Yukihiro (Chiba Institute of Technology) ;
- Takaya, Matsufumi (Chiba Institute of Technology)
- 발행 : 1999.06.01
초록
Electron field emission properties from various CVD diamond films were studied. Diamond films were synthesized by microwave plasma CVD at 1173K and at 673K substrates temperature and pulse microwave plasma CVD at 1173K. B-doped diamond film was synthesized by microwave plasma CVD at 1173K also. Estimation by SEM, both the non-doped diamond film and B-doped diamond film which were synthesized at 1173K substrate temperature were