한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제32권3호
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- Pages.244-248
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- 1999
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
PHOTOELECTRODEPOSITION OF COPPER ON BORON-DOPED DIAMOND FILMS: ITS APPLICATION TO CONDUCTIVE PATTERN FORMING ON DIAMOND AND DIAMOND PHOTOGRAPHIC PHENOMENON
- Yoshihara, S. (Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University) ;
- Shinozaki, K. (Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University) ;
- Shirakashi, T. (Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University)
- 발행 : 1999.06.01
초록
Photoelectrodeposition of copper on semiconductive B-doped diamond films was investigated. There are cleasr morphology differences between photodeposited copper and electrodeposited copper. Photoelecrodeposition proceeded as uniform 2-dimensional growth. On the other hand electrodeposition proceeded as scarce random deposition. By applying this effect we have succeeded in forming a conductive pattern on semiconductive B-doped diamond with the aid of a photo-mask. And it was suggested that the surface reforming caused by photoelectrochemical process could be easily detected by the following metal (copper) deosition method, which is demonstrated as 'Diamond photographic phenomenon'.