Residual Stress Behavior of High Temperature Polyimide Thin Films depending on the Structural Isomers of Diamine

Diamine의 구조적 이성질체에 따른 내열성 폴리이미드 박막의 잔류응력거동

The relationships between morphological structures and residual stress behaviors of polyimide thin films depending on isomeric diamines were investigated. For this study, Poly(phenylene biphenyltetracarboximide) (BPDA-PDA) and poly(oxydiphenylene biphenyltetracarboximide) (BPDA-ODA) films were prepared from their isomeric diamines: 1,3-phenylene diamine (1,3-PDA) 1,4-phenylene diamine (1.4-PDA), 3,4'-oxydiphenylene diamine (3,4'-ODA), and 4,4'-oxydiphenylene diamine (4,4'-ODA), respectively. For those films, residual stresses were detected in-situ during thermal imidization of the isomeric polyimide as a function of processing temperature over the range of 25~$400^{\circ}C$ using. Thin Film Stress Analyzer (TFSA). In comparison, residual stress of BPDA-1.4PDA having better in-plain orientation and chain order was the lowest value of 7MPa whereas those of BPDA-1,3-PDA, BPDA-3,4'-ODA, and BPDA-4,4'-ODA were in the range of 40-50MPa. Conclusively, the effect of morphological nature (chain rigidity, chain order, orientation) and chain mobility relating to the g1ass transition behavior on the residual stress of isomeric polyimide thin films wart analyzed.

이성질체에 따른 폴리이미드 박막의 잔류응력 영향과 모폴로지와의 상관관계가 조사되었다. 이를 위해, Poly(phenylene biphenyltetracarboximide) (BPDA-PDA)와 poly (oxydiphenylene biphenyltetracar-boximide) (BPDA-ODA)를 여러 다른 diamine인 1, 3-phenylene diamine (1, 3-PDA), 1.4-phenylene diamine (1,4-PDA)과 3.4'-oxydiphenylene diamine (3,4'-ODA) , 4,4'-oxydiphenylene diamine (4.4'-ODA)으로부터 제조하였다. 이들 박막에 대하여, Thin Film Stress Analyzer (TFSA)를 이용하여 공정온도 (25~$400^{\circ}C$)하에서 전구체의 열적 이미드화에 따라 실시간으로 폴리이미드 박막의 잔류응력 거동을 측정하였다. 폴리이미드 박막의 잔류응력은 면 방향 배향성과 사슬 질서도가 우수한 BPDA-1,4-PDA가 7MPa로 가장 낮게 나타났으며 BPDA-1,3-PDA, BPDA-3,4'-ODA, BPDA-4,4'-ODA의 경우 40~50Mpa 범위에 있었다. 이성질체에 따른 폴리이미드 박막의 잔류응력은 모폴로지 (사슬 강직도, 질서도, 배향성) 변화 및 유리전이 거동과 관련된 사슬 운동성을 이용하여 분석되었다.