대한전기학회논문지:전기물성ㆍ응용부문C (The Transactions of the Korean Institute of Electrical Engineers C)

대한전기학회 (The Korean Institute of Electrical Engineers)
권호 표지

자화된 헬리칼 공진기 플라즈마 소스를 이용한 고선택비 산화막 식각에 관한 연구

A study on the high selective oxide etching using magnetized helical resonator plasma source

  • 이수부 (인하대 공대 전자·전기·컴퓨터공학과부 석사) ;
  • 임승완 (인하대 공대 전자·전기·컴퓨터공학과부) ;
  • 이석현 (인하대 공대 전자·전기·컴퓨터공학과부)
  • 발행 : 1999.05.01
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

The magnetized helical resonator plasma etcher has been built. Electron density and temperature were measured as functions of rf source power, axial magnetic field, and pressure. The results show electron density increases as the magnetic field increases and reached $2\times1012cm^{-3}$,/TEX>. The oxide etch rate and selectivity to polysilicon were investigated as the above mentioned conditions and self-bias voltage. We can obtain the much improved oxide etch selectivity to polysilicon (60 : 1) by applying the external axial weak magnetic field in magnetized helical resonator plasma etcher.

키워드

참고문헌

  1. Principles of Plasma Discharges and Materials Processing M. A. Lieberman;A. J. Litchenberg
  2. Jpn. J. Appl. Phys. v.32 S. Samukawa;S. Furuoya
  3. High Density Plasma Sources Oleg A. Popov
  4. Memo. UCB/ERL M 90/10 Theory of a helical resonator plasma M. A. Lieberman;A. J. Lichtenberg;D. L. Flamm
  5. Plasma Sources Sci. Technol. v.3 Operation of a helical resonator plasma source M. A. Lieberman;A. J. Lichtenberg;D. L. Flamm
  6. Rev. Sci. instrum. v.65 no.9 Dual mode operation of a helical resonator discharge P. Bletzinger
  7. Cold Plasma in Materials Fabrication Alfred Grill
  8. Plasma Etching in Semiconductor Fabrication Russ A. Morgan
  9. 정기총회 및 추계학술대회 논문집 헬리칼 공진기 플라즈마의 기판플라즈마밀도에 미치는 축방향자계의 영향 김태현;김문영;장상훈;태홍식
  10. Principles of Plasma Discharges and Materials Processing M. A. Lieberman;A. J. Litchenberg
  11. Meas. Sci. Techonol. v.2 Simple method to calculate the operating frequency of a helical resonator-RF discharge tube configuration R F Welton;E W Thomas;R K Reeney;T F Moran
  12. 전기전자재료학회논문지 v.11 no.4 유도결합형 플라즈마원을 이용한 고선택비 산화막 식각에 관한 연구 이수부;박헌건;이석현
  13. Handbook of Plasma Processing Technoloy Stephan M. Rossnagel
  14. J. Vac. Sci. Technol. v.B14 no.4 Comparison of advanced plasma sources for etching applications. V. Polysilicon etching rate, unformity, profile control, and bulk plasma properties in a helical resonator plasma source J. T. C. Lee;N. Layadi;K. V. Guinn;H. L. Maynard;F. P. Klemens;D. E. ibbotson;I. Tepermeister
  15. 박사 학위논문, 서울대학교 자화 유도 결합 플라즈마의 건식 식각 특성에 관한 연구 이호준