대한전기학회논문지:전기물성ㆍ응용부문C (The Transactions of the Korean Institute of Electrical Engineers C)

대한전기학회 (The Korean Institute of Electrical Engineers)
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펄스 레이저 증착법에 의한 $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ 박막의 제작 및 특성

Fabrication and Characterization of$(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ Thin Films by Pulsed Laser Deposition

  • Shim, Kyung-Suk (Dept.of Electric Engineering, Engineering College, Yonsel University) ;
  • Lee, Sang-Yeol (Dept. of Electrical Eng., Yonsei University)
  • 발행 : 1999.05.01
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초록

Dielectric thin films of PLT(28) ($(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$) have been deposited on $Pt/Ti/SiO_2/Si$ substrates in situ by a laser ablation. We have systematically changed the laser fluence from 0.4 J/$cm^2$ to 3 J/$cm^2$, and deposition temperature from $450^{\circ}C\; to\; 700^{\circ}C$. The surface morphology was changed from planar grain structure to columnar structure as the nucleation energy was increased. The PLT thin film with columnar structure showed good dielectric properties. The deposition temperature influenced on nucleation energy much stronger than the laser energy density did.

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참고문헌

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