References
- Material Science and Engineering v.B4 G.S.Oehrlein
- J. Vac. Sci. Technol. v.A12 O.Joubert;G.S.Oehrlein;Y.Zhang
- Jpn. J. Appl. Phys. v.34 H.Kimura;K.Shiozowa;K.Kawai;H.Miyatake;M.Yoneda
- Jpn. J. Appl. Phys. v.32 S.Samukawa
- J. Vac. Sci. Technol. v.A13 Z.Wan;J.Liu;H.H.Lamb
- J. Vac. Sci. Technol. v.A12 O.Joubert;G.S.Oehrlein;M.Surendra
- J. Vac. Sci. Technol. v.B9 A.J.Perry;D.Vender;R.W. Bosewell
- Plasma Source Sci. Technol. v.2 H.Kitagawa;A.Tsunoda;H.Shindo;Y.Horiike
- Jpn. J. Appl. Phys. v.34 K.Kubota;H.Matsumoto;H.Shindo;S.Shingubara;Y.Horiike
- J. Vac. Sci. Technol. v.A12 F.H.Bell;O.Joubert;G.S.Oehrlein;Y.Zhang;D.Vender
- Jpn. J. Appl. Phys. v.33 T.Fukasawa;A.Nakamura;H.Shindo;Y.Horiike
- J. Vac. Sci. Technol. v.A12 G.S.Oehrlein;Y.Zhang;D.Vender;M.Haverlag
- J. Vac. Sci. Technol. v.A12 G.S.Oehrlein;Y.Zhang;D.Vender;O.Joubert
- Proceedings of 2nd International Conference on Reactive Plasmaa and 11th Symposium on Plasma Proceeding v.Ⅷc-7 N.Jiwari;T.Fukasawa;A.Nakamura;K.Kubota;H.Shindo;Y.Horiike
- AVS monograph series v.M-4 Plasma Etching and Reactive Ion Etching J.W.Coburn
- J. Vac. Sci. Technol. v.A8 A.S.Yapsir;G.Fortuno-wiltshire;J.P.Gambino;R.H.Kastl;C.C.Parks
- J. Electrochem. Soc. v.141 T.J.Cotler;J.Foster;M.Barnes;W.Koconf
- 한국표면공학회지 v.31 김현수;이원정;백종태;염근영
- J. Vac. Sci. Technol. v.A14 H.J.Lee;J.H.Kim;K.W.Whang;J.H.Joo
- J. Electrochem. Soc. v.137 S.J.Fonash
- Solid State Electronics v.29 P.Spirito;C.M.Ransom;G.S.Oehrlein
- J. Vac. Sci. Technol. v.A13 W.Wu;P.K.McLarty
- J. Appl. Phys. v.69 O.S.Nagawa;S.Ashok;J.K.Kruger
- J. Vac. Sci. Technol. v.A15 W.J.Nam;G.Y.Yeom;J.H.Kim;K.W.Whang;J.K.Yoon