질화규소 이층 층상재료의 접촉파괴거동

Contact Fracture behavior of Silicon Nitride Bilayer

  • 이기성 (한국과학기술원 재료공학과) ;
  • 이승건 (미국 표준과학연구소) ;
  • 김도경 (한국과학기술원 재료공학과)
  • Lee, Kee-Sung (Dept. of Materials Science and Engineering, Korea Advanced Institute of Science and Technology) ;
  • Lee, Seung-Kun (Materials Science and Engineering Laboratory, National Institute of Standards and Technology) ;
  • Kim, Do-Kyung (Dept. of Materials Science and Engineering, Korea Advanced Institute of Science and Technology)
  • 발행 : 1998.04.01

초록

질화규소로 코팅된 질화규소-질화붕소 이층 층상복합재료의 접촉하중에 의한 파괴거동을 고찰하였다. 그 결과 코팅층내에서 새로운 종류의 균열들이 발견되었고, 이러한 균열들은 기하학적으로 원추 모양을 가짐을 확인하였다. 외부에서 가한 하중의 에너지는 코팅층 뿐 아니라 damage를 흡수할 수 있는 기판층 내로 분산되어 코팅층에서 시작된 균열들의 전파가 억제되었다.

The fracture behavior of $Si_3N_4N$, coated $Si_3N_4N$-BN composite was studied by the Hertzian indentation technique. New types of contact-induced cracks were found, and it was confirmed that these cracks have cone crack geometry. Contact damage was distributed in the substrate layer, which can absorb energy, as well as in the coating layer, so the propagation of initiated cracks in the coating layer were suppressed.

키워드

참고문헌

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