Electrical & Electronic Materials (E2M - 전기 전자와 첨단 소재)
- Volume 10 Issue 7
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- Pages.700-705
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- 1997
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- 2982-6268(pISSN)
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- 2982-6306(eISSN)
A Study on Material Properties and Fabrication of ITO Thin Films by Unbalanced-Magnet Structure in Magnetron Sputtering
DC 마그네트론 스파터링의 비대칭 자석강조에 의한 ITO 박막 제조 및 물성에 관한 연구
Abstract
Transparent conducting indium tin oxide (TC-ITO) thin films are deposited on soda lime glass by a dc magnetron sputtering technique having the unbalanced-magnet structure in order to improve the electrical/material characteristics and to avoid the surface damages. The material properties are measured by the x-ray diffractometer (XRD) and atomic force microscope (AFM). The (400) peak as the preferred orientation of <100> direction for ITO thin films is stabilized with the increase of substrate temperature. The surface roughness estimated by AFM 3D image at the substrate temperature of 40
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