미소 전류 자극이 TPS-IMZ 임프란트 주위의 골유착과 골형성에 미치는 영향

DIRECT CURRENT EFFECT ON THE BONE FORMATION AND OSSEOINTEGRATION AROUND TPS-IMZ IMPLANT

The purpose of this study is to investigate the effect of constant direct current electrical stimulation in healing the bone defects and surrounding tissues of the endo-oseous(TPS-IMZ) implants. Implants were inserted in the femur of adult dogs. Then a constrant direct current of approximately $10{\mu}A$ was applied. Artificial bone defects were prepared on one side of the implant site. Experimental groups were divided into 4 : control group : bone defect without treatment group I : bone defect filled with hydroxyapatite powders group II : bone defect, in which a negative and positive electrodes were inserted 5mm apart from both sides of the implant group III : bone defect, in which negative current was directly connected to the IMZ implant and a positive electrode was placed 10mm apart from the implant The animals were sacrificed in the 1st, 2nd, 4th and 8th week after implantation for the light microscopic examination. The results obtained were as follows : 1. In electrically stimulated experimental groups, new bone formation and osseointegration around implants were accelerated. 2. Group III showed the greatest activity in new bone formation. Osteoconductivity around HA particles was observed in group 1. 3. The defect area of the control group was healed by forming new bone, which grew from the underlying cancellous bone. The defect areas of the electrically stimulated experimental groups were healed by newly formed bone, which grew upward from the cancellous bone and downward from the periosteum. 4. 8 weeks after implantation, all the groups showed good osseointegration between the surrounding bone and implants.