Korean Journal of Air-Conditioning and Refrigeration Engineering (설비공학논문집)
- Volume 7 Issue 3
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- Pages.521-527
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- 1995
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- 1229-6422(pISSN)
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- 2465-7611(eISSN)
Measurement of Particle Deposition Velocity Toward a Vertical Wafer Surface
수직 웨이퍼상의 입자 침착속도의 측정
Abstract
The average particle deposition velocity toward a vertical wafer surface in a vertical airflow chamber was measured by a wafer surface scanner(PMS Model SAS-3600). Polystyrene latex(PSL) spheres with diameters between 0.3 and