참고문헌
- Integrated Ferroelectrics v.4 PirreC.Fazen
- IDEM Tech. Dig. v.259 H.Watanabe
- ISAF v.356 J.F.Scott;M.Azuma;E.Fujii;T.Otsuki;G.Kano;M.C.Scott;C.A.Paz de Araujo;L.D.McMillan;T.Roberts
- Jpn. J. Appl. Phys v.33 Takaaki Kawahara;MikioYamamuka;tetsuro Makita;Jiro Naka;AkimasaYukki;Noboru Mikami;Kouichi Ono
- Jpn. J. Appl. Phys v.33 Takeharu Kuroiwa;YoshikazuTsunemine;Tsuyoshi Horikawa;Tetsuro Makita;Jyunji Tanimura;Noboru Mikami;Kazunao Sato
- Jpn. J. Appl. Phys v.33 Pijush Bhattcharya;Kyung-ho Park;Yasushiro Nishioka
- Jpn.J.Appl.phys v.33 no.5297 KazuhideAbe;SchuichiKomatsu
- IEEE Trans. on ultrasonic, ferroelectric and frequency control v.38 no.6 John Carrano;Chandra Sudhama;Vinay Chikarmane;JACK Lee;Al Tasch;William Shepherd;Norman Abt
- Integrated Ferrolectrics v.4 J.F.Scott;M.Azuma;C.A.Paz de Araujo;L.D.McMillan;M.C.Scott;T.Roberts
- Deposition technologies for films and coatings Rointain F.Bushah(et al.)
- Thin Solid Films v.130 A.Gittis;D.Dobrev
- Thin Silid Films v.117 J.Pelleg;L.Z.Zerin;S.Lungo
- J. Appl. Phys v.39 F.Witt;R.W.Vook