참고문헌
- Mater.Res.Soc.Symp.Proc. v.310 Growth and Characterization of Ferroelectric Pb(Zr,Ti)O₃Thin Films by MOCVD Using a 6 inch Single Wafer CVD System M.Shimizu;M.Fujimoto;T.Katayama;T.Shiosaki;K.Nakaya;M.Fukagawa;E.Tanikawa
-
Appl.Phys.Lett.
v.64
no.26
Epitaxial Growth of SrTio₃/
$YBa_{2}Cu_{3}O_{7-x}$ Heterostructures by Plasmaenhanced Metalorganic Chemical Vapor Deposition S.Liang;C.S.Chern;Z.Q.Shi - Jpn.J.Appl.Phys. v.32 Dielectric Properties of (Ba,Sr)Tio₃Thin Films Deposited by RF Sputtering T.Horikawa;N.Mikami;T.Makita;J.Tanimura;M.Kataoka;K.Sato;M.Nunoshita
-
Appl.Phys.Lett.
v.64
no.23
Heteroepitaxial Growth of
Ba_{1-x}Sr_{x}Tio_{3}/YBa_{3}Cu_{3}O_{7x} by Plasama-Enhanced Metalorganic Chemical Vapor Deposition C.S.Chern;S.Yoon;A.Safari - Jpn.J.Appl.Phys. v.32 Preparation and Properties of (Ba,Sr)Tio₃Thin Films by RF Magnetron Sputtering N.Ichinose;T.Ogiwara
-
J.Appl.Phys.
v.76
no.5
Preparation of Thin Films (
$Ba_{o5}Sr_{o5}$ )TiO₃by the Laser Ablation Technique and Electrical Properties S.G.Yoon;J.C.Lee;A.Safari - Jpn.J.of Appl.Phys. v.33 no.9B Step Coverage and Electrical Properties of (Ba,Sr)TiO₃Films Prepared by LSCVD using TiO(dpm)₂ T.Kawahara;M.Yamamuka;T.Makita;J.Naka;A.Y.unki;N.Mikami;K.Ono
- Appl.Phys.Lett v.60 no.1 Epitaxial Growth of BaTio₃Thin Fims by Organometalic Chemical Vapor Deposition L.A.Wills;B.W.Wessels;D.S.Richeson;T.J.Marks
- Structure of Metals C.Barret;T.B.Massalski