E2M - 전기 전자와 첨단 소재 (Electrical & Electronic Materials)
- 제7권3호
- /
- Pages.220-224
- /
- 1994
- /
- 2982-6268(pISSN)
- /
- 2982-6306(eISSN)
광기록 매질로 이용되는 Te계 ART구조의 광학적 해석
The optical analysis of Te-based ART structure for the optical recording media
초록
In this study, we discussed the optical property to find the optimal condition of Te-based antireflection trilayer(ART) structure for a high density optical recording. It was found that the optical property was improved by suggesting the environmental parameters satisfied the optimum condition. As the results, the optimized(.lambda.=8.000
키워드