Journal of the Korean Institute of Telematics and Electronics (대한전자공학회논문지)
- Volume 25 Issue 11
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- Pages.1329-1334
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- 1988
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- 1016-135X(pISSN)
Effects of NH3 on the Growth of Oxide Film by Infrared-CVD Method
적외선 CVD 방법을 이용한 산화막 성장에 $NH_3$ 가 미치는 영향
- Lee, Chul-Seung (Dept. of Elec. Eng., Kyunghee Univ.) ;
- Chung, Kwan-Soo (Dept. of Elec. Eng., Kyunghee Univ.) ;
- Kim, Chul-Ju (Dept. of Elec. Eng., Seoul City Univ.)
- Published : 1988.11.01
Abstract
A new method was developed for growing oxidation film by thermal reaction of
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