Journal of the Korean Institute of Telematics and Electronics (대한전자공학회논문지)

The Institute of Electronics and Information Engineers (대한전자공학회)
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Development and Application of Rapid Thermal Process System

급속 열처리 시스템의 개발 및 응용

  • 김윤태 (한국전자통신연구소 화합물반도체연구부) ;
  • 정기로 (한국전자통신연구소 화합물반도체연구부) ;
  • 김호영 (한국전자통신연구소 화합물반도체연구부) ;
  • 김현태 (한국전자통신연구소 화합물반도체연구부) ;
  • 유형준 (한국전자통신연구소 화합물반도체연구부)
  • Published : 1988.09.01
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Abstract

In this study, we developed a proto-type RTP equipment by using tungsten halogen lamps. The system has been designed utilizing the result of the numerical analysis of the reactor. In order to analyze the system performance, experiments for activation of implanted atoms and oxidation process were performed. As a result, we obtained 2-3% uniformity in sheet resistance and 2-4% uniformity in oxide thickness, although after a long time process at high temperatures slip lines and warpage of the wafer have been observed.

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