A Thermodynamic Calculation of Equilibrium Concentration for the CVD of SiC

SiC의 화학증착에 대한 열역학적 평형농도계산

Thermodynamic calculation for the CVD of SiC from methyltrichlorosilane(MTS) was done in some range of deposition condition to identify optimum condition. The results show that the most considerable chemical species are chloride and chlorosilane for silicon source and methane and acetylene for carbon source. In order to yield single phase ${\beta}$-SiC it is believed that optimum temperature range is between 1500 and $1700^{\circ}k$. With increasing temperature, stable phase is changed from Si+SiC phase to C+SiC phase. It is believed because equilibrium concentration of silicon source decrease and equilibrium concentration of carbon source increases with increasing temperature.