초록
Stabilization characteristics of highly $N_2$-diluted $CH_4-O_2$ flame in an axially two-section porous inert medium were experimentally investigated for its application to the waste gas scrubber in semiconductor manufacturing processes. The flame behaviors were observed with respect to the fuel and $N_2$ flow rates and the equivalence ratios. As a result, four kinds of flame behaviors such as stable, flashback crossing the interface, blowout and sudden extinction were observed. It was also found that there exists two flame regime divided by a critical fuel flow rate. In addition, the flame stability was discussed based on the $N_2$ index which means the abatement capacity of our combustor in scrubbing the waste gas from the semiconductor processes.