Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2013.02a
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- Pages.540-540
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- 2013
The Study on Characteristics of N-Doped Ethylcyclohexane Plasma-Polymer Thin Films
- Seo, Hyeon-Jin (Department of Chemistry, Sungkyunkwan University) ;
- Jo, Sang-Jin (Department of Chemistry, Sungkyunkwan University) ;
- Lee, Jin-U (Department of Chemistry, Sungkyunkwan University) ;
- Jeon, So-Hyeon (Department of Chemistry, Sungkyunkwan University) ;
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Bu, Jin-Hyo
(Department of Chemistry, Sungkyunkwan University)
- Published : 2013.02.18
Abstract
In this studying, we investigated the basic properties of N-doped plasma polymer. The N-doped ethylcyclohexane plasma polymer thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Ethylcyclohexenewas used as organic precursor (carbon source) with hydrogen gas as the precursor bubbler gas. Additionally, ammonia gas [NH3] was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, Raman spectroscopy, FE-SEM, and water contact angle measurement. The ellipsometry results showed the refractive index change of the N-doped ethylcyclohexene plasma polymer film. The FT-IR spectrashowed that the N-doped ethylcyclohexene plasma polymer films were completely fragmented and polymerized from ethylcyclohexane.
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