한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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- Pages.288-288
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- 2012
Hydrogen Plasma와 Oxygen Plasma를 이용한 50 nm 텅스텐 패턴의 Oxidation 및 Reduction에 관한 연구
- 발행 : 2012.08.20
초록
The oxidation characteristics of tungsten line pattern during the carbon-based mask layer removal process using oxygen plasmas and the reduction characteristics of the WOx layer formed on the tungsten line surface using hydrogen plasmas have been investigated for sub-50 nm patterning processes. The surface oxidation of tungsten line during the mask layer removal process could be minimized by using a low temperature (