Oxidation of TiZrAlN nanocomposite thin films in air at temperatures between 500 and $700^{\circ}C$

TiZrAlN의 500-$700^{\circ}C$ 사이에서 공기 중 산화

  • 김민정 (성균관대학교 신소재공학과) ;
  • 봉성준 (성균관대학교 신소재공학과) ;
  • 이동복 (성균관대학교 신소재공학과)
  • Published : 2011.05.19

Abstract

Quaternary TiZrAlN nanocomposite thin films with a composition of 20.7Ti-22.2Zr-2.7Al-54.4N (at.%) were deposited by the closed-field unbalanced magnetron sputtering (CFUBMS) method and oxidized in air at temperatures between 500 and $700^{\circ}C$. The oxides formed were $TiO_2$, $ZrO_2$, and $Al_2O_3$. The films had inferior oxidation resistance because the amounts of $ZrO_2$ and $TiO_2$ were large while the amount of $Al_2O_3$ was small. The oxidation progressed primarily by the inward diffusion of oxygen and the outward diffusion of nitrogen.

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